Ti-doping of hematite films with multilayered particle size distribution by magnetron sputtering
نویسندگان
چکیده
α-Fe2O3 films with a layered distribution of nano and submicron particles were synthesized Ti-doped successfully. Morphology, element phase composition, electrochemical properties one-layered, multilayered, investigated. Doped multilayered hematite have higher catalytic water oxidation efficiency than both undoped films.
منابع مشابه
CrNx Films Prepared by DC Magnetron Sputtering and High-Power Pulsed Magnetron Sputtering: A Comparative Study
CrNx (0 ≤ x ≤ 0.91) films synthesized using highpower pulsed magnetron sputtering, also known as high-power impulse magnetron sputtering (HiPIMS), have been compared with those made by conventional direct-current (dc) magnetron sputtering (DCMS) operated at the same average power. The HiPIMS deposition rate relative to the DCMS rate was found to decrease linearly with increasing emission streng...
متن کاملSURFACE STRUCTURE OF TIN/TI MULTI-LAYERED THIN FILMS DEPOSITED ONTO Ti-6Al-4V ALLOY BY MAGNETRON SPUTTERING
Ti-6Al-4V alloy attracting attention as a biomaterial features excellent mechanical properties and corrosion resistance, and super plasticity, so enables the forming of denture bases of complicated shapes. However, this alloy contains aluminum and vanadium liable to do serious harm to human bodies [1,2], so actual use will require prevention of direct contact with biological tissues. In our pre...
متن کاملMechanical Properties and Microstructural Evolution of Ta/TaNx Double Layer Thin Films Deposited by Magnetron Sputtering
Crystalline tantalum thin films of about 500nm thickness were deposited on AISI 316L stainless steel substrate using magnetron sputtering. To investigate the nano-mechanical properties of tantalum films, deposition was performed at two temperatures (25°C and 200°C) on TaNx intermediate layer with different N2/Ar flow rate ratio from 0 to 30%. Nano-indentation was performed to obtain the mechani...
متن کاملDEPOSITION OF THIN TiO2 FILMS BY DC MAGNETRON SPUTTERING METHOD
Sputter deposition process is another old technique being used in modern semiconductor industries. Sputtering is a process that can deposit TiO2 material on wafer/glass substrates. In this process target is connected to negative high voltage. Further argon gas is introduced into the chamber and is ionized to a positive charge. The positively charged argon atoms are attracted and strike the nega...
متن کاملCharacterization of PZT Ferroelectric Thin Films by RF-magnetron Sputtering
By using Radio Frequency (RF) magnetron sputtering method, Pb(Zr0.5Ti0.5)O3 (PZT) thin films were deposited on Pt/Ti/ SiO2/Si substrates. Pt/Ti bottom electrode was fabricated on SiO2/Si substrates by magnetron dual-facing-target sputtering system. Phase and crystalline structure analyses of the PZT films were performed on an X-ray diffraction(XRD), Surface morphology, roughness and particle si...
متن کاملذخیره در منابع من
با ذخیره ی این منبع در منابع من، دسترسی به آن را برای استفاده های بعدی آسان تر کنید
ژورنال
عنوان ژورنال: Journal of physics
سال: 2021
ISSN: ['0022-3700', '1747-3721', '0368-3508', '1747-3713']
DOI: https://doi.org/10.1088/1742-6596/1954/1/012006